热熔还原法制备超硬复合相氮化碳及其工艺探索

本文采用热熔还原法,以聚氯乙烯、氯化铵、氧化铁为原料制备复合超硬相氮化碳(α/β-C3 N4).采用X射线衍射仪(XRD)、扫描电子显微镜(SEM)以及透射电子显微镜(TEM)对样品进行表征.在此基础上分析了不同温度和原料配比下合成复合相C3 N4的物相组成及形貌变化.结果表明样品形貌随着原料配比的不同在颗粒、棒状、纳米线之间转变.当C、N和Fe之间摩尔比为3:4:0.4时,所制备出的样品呈纳米线状,纳米线的直径约为15 nm,结晶性良好.而在其它配比下,只能获得棒状或颗粒状α/β复合相C3 N4.     

Visual exploration of dependency graph in source code via embedding-based similarity

Journal of Visualization -  A large software system contains millions of lines of source code, and the development often involves many developers over a long period. How to understand and...     

钙钛矿结构RFeO3晶体的磁化跃迁效应研究进展

钙钛矿稀土正铁氧体RFeO₃具有丰富的磁性,这主要源于4f电子层的稀土离子和3d电子层的铁离子之间复杂的相互作用。磁化跃迁作为RFeO₃体系中的重要现象,是指体系中的稀土离子磁矩和铁离子磁矩在特定的磁场和温度下发生180°旋转,宏观表现为磁热曲线中磁化强度发生断崖式变化。本文综述了不同化合物RFeO₃的两种磁化跃迁现象,第一类磁化跃迁通常具有补偿点,F_R与F_Fe的排列耦合方向不变,第二类磁化跃迁则相反,且两类磁化跃迁出现的温区受外加磁场的调控。     

等离子体电极普克尔盒研究进展

等离子体电极普克尔盒(PEPC)用作多程放大控制、自激振荡抑制以及反激光隔离,是大型高功率固体激光器的核心器件。本文从高功率固体激光器的发展对光开关提出的要求出发,系统地综述了等离子体电极普克尔盒的性能特点以及研究进展。重点介绍了中国工程物理研究院激光聚变研究中心近年来在PEPC研究方面所取得的进展,包括单脉冲驱动的组合口径PEPC、低损耗PEPC以及重复频率运转的PEPC。     

旋涂法制备掺杂BiOX薄膜及光催化性能研究

采用旋涂的方法在基底材料表面原位生长BiOX(X=C1、Br、I)薄膜材料.样品的晶体结构和光学性质等通过X射线粉末衍射(XRD)、透射电子显微镜(TEM)、紫外可见漫反射光谱(UV-Vis)进行了表征.结果表明旋涂法制备的BiOX薄膜是纯净的,无其他杂质,均匀性好.通过对BiOX薄膜材料的光催化性能和瞬态表面光电压技术(TPV)进行了研究,发现卤素掺杂的BiOBr0.48I052具有较好的光催化性能.其结果表明催化性能提高的原因可能是BiOBr0.48I0.52薄膜在光照下可以产生更强的光生载流子并具有更长的光生载流子寿命.     

Cu2O/TiO2-Bi2WO6三元复合催化剂的制备及光催化性能研究

采用水热法制备花状Bi2 WO6,并利用超声分散法制备了Cu2 O/TiO2-Bi2 WO6复合光催化剂,通过FESEM、XRD、XPS、FI-IR、UV-vis DRS和PL对光催化剂进行了分析和表征.表征结果证明:花状Bi2 WO6表面负载着碎片状的TiO2和立方体Cu2 O形成Cu2 O/TiO2-Bi2 WO6复合光催化剂;以短链脂肪酸(SCFAs)为牺牲剂,考察复合光催化剂的光催化产生氢气和烷烃的性能.实验结果表明:Cu2 O/TiO2-Bi2 WO6复合光催化剂以乙酸为牺牲剂,主要产氢气和甲烷,降解率高达91.82;;以丙酸为牺牲剂,产物主要是乙烷和丁烷,降解率高达90.70;;以丁酸为牺牲剂,除了氢气,甲烷,乙烷,丙烷,丁烷外,气体产物还含有一定量的戊烷,其降解率高达91.50;.结合反应液中间产物的成分进行检测,由此推断出光催化反应的可能机理.     

Noise-induced phenomena in a versatile class of prototype dynamical system with time delay

Nonlinear Dynamics - This work presents a general class of prototype birhythmic dynamical systems, which can be extensively used to study the generation of complex bifurcation of limit cycles....     

A reconfigurable terahertz polarization converter based on metal–graphene hybrid metasurface

A metal-graphene hybrid metasurface polarization converter is designed in this Letter.The unit cell of the hybrid metasurface is composed of a butterfly-shaped structure whose branches are connected by multi-layer graphene sheets.The proposed device can be reconfigured from linear-to-circular polarization to cross-polarization by changing the Fermi energy of graphene.The simulation results show that for three-layer graphene,the device acts as a linear-to-circular polarization converter when EF=0 eV and switches to a cross-polarization converter when EF=0.5 eV.Compared with single-layer graphene,the device with three-layer graphene can maintain the cross-polarization conversion performance under low Fermi energy.Furthermore,two equivalent circuits in the x and y directions are developed to understand the working mechanism of the device.     

排名聚合算法在少量长列表聚合中的性能比较分析

排名聚合将多个排名列表聚合成一个综合排名列表,可应用于推荐系统、链路预测、元搜索、提案评选等.当前已有工作从不同角度对不同排名聚合算法进行了综述、比较,但存在算法种类较少、数据统计特性不清晰、评价指标不够合理等局限性.不同排名聚合算法在提出时均声称优于已有算法,但是用于比较的方法不同,测试的数据不同,应用的场景不同,因此何种算法最能适应某一任务在很多情况下仍不甚清楚.本文基于Mallows模型,提出一套生成统计特性可控的不同类型的排名列表的算法,使用一个可应用于不同类型排名列表的通用评价指标,介绍9种排名聚合算法以及它们在聚合少量长列表时的表现.结果发现启发式方法虽然简单,但是在排名列表相似度较高、列表相对简单的情况下,能够接近甚至超过一些优化类方法的结果;列表中平局数量的增长会降低聚合排名的一致性并增加波动;列表数量的增加对聚合效果的影响呈现非单调性.整体而言,基于距离优化的分支定界方法 (FAST)优于其他各类算法,在不同类型的排名列表中表现非常稳定,能够很好地完成少量长列表的排名聚合.     

Surface passivation in n-type silicon and its application in silicon drift detector

Based on the surface passivation of n-type silicon in a silicon drift detector(SDD), we propose a new passivation structure of SiO2/Al2O3/SiO2 passivation stacks. Since the SiO2 formed by the nitric-acid-oxidation-of-silicon(NAOS)method has good compactness and simple process, the first layer film is formed by the NAOS method. The Al2O3 film is also introduced into the passivation stacks owing to exceptional advantages such as good interface characteristic and simple process. In addition, for requirements of thickness and deposition temperature, the third layer of the SiO2 film is deposited by plasma enhanced chemical vapor deposition(PECVD). The deposition of the SiO2 film by PECVD is a low-temperature process and has a high deposition rate, which causes little damage to the device and makes the SiO2 film very suitable for serving as the third passivation layer. The passivation approach of stacks can saturate dangling bonds at the interface between stacks and the silicon substrate, and provide positive charge to optimize the field passivation of the n-type substrate.The passivation method ultimately achieves a good combination of chemical and field passivations. Experimental results show that with the passivation structure of SiO2/Al2O3/SiO2, the final minority carrier lifetime reaches 5223 μs at injection of 5×10¹⁵ cm^-3. When it is applied to the passivation of SDD, the leakage current is reduced to the order of nA.